Invention Grant
US08906707B2 Device having a multilayered structure and method of fabricating thereof 有权
具有多层结构的装置及其制造方法

Device having a multilayered structure and method of fabricating thereof
Abstract:
The invention provides a multilayered device and the method for fabricating the same. The multilayered device comprises a substrate, a first layer deposited on the substrate, a second layer deposited on the first layer, and a third layer deposited on the second layer. The coverage of the second layer is determined by a rate of crystallization of the third layer. The rate of crystallization of the third layer is determined by measuring X-ray diffraction of the device.
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