发明授权
- 专利标题： Hardmask composition and associated methods
- 专利标题（中）： 硬掩模组成及相关方法
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申请号： US12320874申请日： 2009-02-06
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公开(公告)号： US08916329B2公开(公告)日： 2014-12-23
- 发明人: Sang Kyun Kim , Sang Hak Lim , Mi Young Kim , Sang Ran Koh , Hui Chan Yun , Do Hyeon Kim , Dong Seon Uh , Jong Seob Kim
- 申请人： Sang Kyun Kim , Sang Hak Lim , Mi Young Kim , Sang Ran Koh , Hui Chan Yun , Do Hyeon Kim , Dong Seon Uh , Jong Seob Kim
- 申请人地址： KR Gumi-si, Gyeongsangbuk-do
- 专利权人： Cheil Industries, Inc.
- 当前专利权人： Cheil Industries, Inc.
- 当前专利权人地址： KR Gumi-si, Gyeongsangbuk-do
- 代理机构： Lee & Morse, P.C.
- 优先权： KR10-2006-0075842 20060810
- 主分类号： G03F7/075
- IPC分类号： G03F7/075 ; H01L21/027 ; C09D183/04 ; C08G77/04 ; H01L21/311
摘要：
A hardmask composition for processing a resist underlayer film includes a solvent and an organosilane polymer, wherein the organosilane polymer is represented by Formula 6: In Formula 6, R is methyl or ethyl, R′ is substituted or unsubstituted cyclic or acyclic alkyl, Ar is an aromatic ring-containing functional group, x, y and z satisfy the relations x+y=4, 0.4≦x≦4, 0≦y≦3.6, and 4×10−4≦z≦1, and n is from about 3 to about 500.
公开/授权文献
- US20090226824A1 Hardmask composition and associated methods 公开/授权日：2009-09-10