发明授权
- 专利标题: Offset magnet compensation for non-uniform plasma
- 专利标题(中): 用于不均匀等离子体的偏移磁体补偿
-
申请号: US11669763申请日: 2007-01-31
-
公开(公告)号: US08920613B2公开(公告)日: 2014-12-30
- 发明人: Christopher Boitnott , Keith A. Miller
- 申请人: Christopher Boitnott , Keith A. Miller
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理商 Charles S. Guenzer
- 主分类号: C23C14/34
- IPC分类号: C23C14/34 ; C23C14/35 ; C23C14/04 ; H01J37/34
摘要:
A non-axisymmetric electromagnet coil used in plasma processing in which at least one electromagnet coil is not symmetric with the central axis of the plasma processing chamber with which it is used but is symmetric with an axis offset from the central axis. When placed radially outside of an RF coil, it may reduce the azimuthal asymmetry in the plasma produced by the RF coil. Axisymmetric magnet arrays may include additional axisymmetric electromagnet coils. One axisymmetric coil is advantageously placed radially inside of the non-axisymmetric coil to carry opposed currents. The multiple electromagnet coils may be embedded in a molded encapsulant having a central bore about a central axis providing the axisymmetry of the coils.
公开/授权文献
- US20080179183A1 OFFSET MAGNET COMPENSATION FOR NON-UNIFORM PLASMA 公开/授权日:2008-07-31