Invention Grant
US08927189B2 Photoresist composition and method of manufacturing display device using same
有权
光刻胶组合物及使用其的显示装置的制造方法
- Patent Title: Photoresist composition and method of manufacturing display device using same
- Patent Title (中): 光刻胶组合物及使用其的显示装置的制造方法
-
Application No.: US13961458Application Date: 2013-08-07
-
Publication No.: US08927189B2Publication Date: 2015-01-06
- Inventor: Gwui-Hyun Park , Pil Soon Hong , Jinho Ju , Taegyun Kim , Jin-Su Byun , Dong Min Kim , Seung Ki Kim , Doo Youn Lee
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2013-0021421 20130227
- Main IPC: G03F7/023
- IPC: G03F7/023 ; G03F7/30 ; H01L21/312 ; G03F7/008 ; G03F7/20
Abstract:
A photoresist composition including a binder resin including a novolac resin represented by Chemical Formula 1, a diazide photosensitive initiator, and a solvent including a base solvent and an auxiliary solvent, wherein the base solvent includes propylene glycol monomethyl ether acetate, and the auxiliary solvent includes dimethyl-2-methylglutarate and ethyl beta-ethoxypropionate, wherein in Chemical Formula 1, R1 to R9 are each independently a hydrogen atom or an alkyl group, “a” is an integer number from 0 through 10, “b” is an integer number from 0 through 100, and “c” is an integer number from 1 through 10.
Public/Granted literature
- US20140242515A1 PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING DISPLAY DEVICE USING SAME Public/Granted day:2014-08-28
Information query
IPC分类:
