Invention Grant
- Patent Title: Mask and method of manufacturing array substrate using the same
- Patent Title (中): 使用其制造阵列基板的掩模和方法
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Application No.: US13865675Application Date: 2013-04-18
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Publication No.: US08927199B2Publication Date: 2015-01-06
- Inventor: Soo-Wan Yoon , Yeong-Keun Kwon , Chong-Chul Chai
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin
- Agency: H.C. Park & Associates, PLC
- Priority: KR10-2011-0006652 20110124
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L21/02 ; H01L27/12

Abstract:
A mask includes: a substrate that includes a central area and a peripheral area disposed around the central area; and lenses disposed in rows and columns, in the central area and the peripheral area. The lenses of opposing sides of the peripheral area may be disposed in different rows or columns. For a given amount of input light, the lenses of the peripheral area may focus less light on a substrate than the lenses of the central area. The mask may be disposed over the substrate in different positions, and then the substrate may be irradiated through the mask, while the mask is in each of the positions. The peripheral portion of the mask may be disposed over the same area of the substrate, while the mask is in different ones of the positions.
Public/Granted literature
- US20130230950A1 MASK AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME Public/Granted day:2013-09-05
Information query
IPC分类: