Invention Grant
- Patent Title: Thermal via for 3D integrated circuits structures
- Patent Title (中): 热通道用于3D集成电路结构
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Application No.: US13780033Application Date: 2013-02-28
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Publication No.: US08933540B2Publication Date: 2015-01-13
- Inventor: Timothy H. Daubenspeck , Jeffrey P. Gambino , Michael J. Hauser , Christopher D. Muzzy , Wolfgang Sauter , Timothy D. Sullivan
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent L. Jeffrey Kelly; Anthony J. Canale
- Main IPC: H01L23/34
- IPC: H01L23/34 ; H01L25/00

Abstract:
A three dimensional integrated circuit (3D-IC) structure, method of manufacturing the same and design structure thereof are provided. The 3D-IC structure includes two chips having a dielectric layer, through substrate vias (TSVs) and pads formed on the dielectric layer. The dielectric layer is formed on a bottom surface of each chip. Pads are electrically connected to the corresponding TSVs. The chips are disposed vertically adjacent to each other. The bottom surface of a second chip faces the bottom surface of a first chip. The pads of the first chip are electrically connected to the pads of the second chip through a plurality of conductive bumps. The 3D-IC structure further includes a thermal via structure vertically disposed between the first chip and the second chip and laterally disposed between the corresponding conductive bumps. The thermal via structure has an upper portion and a lower portion.
Public/Granted literature
- US20140239457A1 THERMAL VIA FOR 3D INTEGRATED CIRCUITS STRUCTURES Public/Granted day:2014-08-28
Information query
IPC分类: