Invention Grant
- Patent Title: Structures for registration error compensation
- Patent Title (中): 结构注册误差补偿
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Application No.: US13659541Application Date: 2012-10-24
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Publication No.: US08933768B2Publication Date: 2015-01-13
- Inventor: Edward A. Richley , Sifen Luo
- Applicant: ZIH Corp.
- Applicant Address: US IL Lincolnshire
- Assignee: ZIH Corp.
- Current Assignee: ZIH Corp.
- Current Assignee Address: US IL Lincolnshire
- Agency: Alston & Bird LLP
- Main IPC: H01P1/203
- IPC: H01P1/203 ; H01P7/08 ; H01P11/00

Abstract:
Metallization layer structures for reduced changes in radio frequency characteristics due to registration error and associated methods are provided herein. An example resonator includes a first conductive layer defining an error limiting feature and a second conductive layer. The resonator further includes at least one communication feature configured to electrically couple the first conductive layer and the second conductive layer at a communication position. The error limiting feature is configured to reduce changes in radio frequency characteristics of the resonator due to registration error. Methods of manufacturing resonators are also provided herein.
Public/Granted literature
- US20130099878A1 STRUCTURES FOR REGISTRATION ERROR COMPENSATION Public/Granted day:2013-04-25
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