发明授权
- 专利标题： Manufacturing method of thin film and metal line for display using the same, thin film transistor array panel, and method for manufacturing the same
- 专利标题（中）： 用于使用该显示器的薄膜和金属线的制造方法，薄膜晶体管阵列面板及其制造方法
-
申请号： US12931516申请日： 2011-02-03
-
公开(公告)号： US08946025B2公开(公告)日： 2015-02-03
- 发明人: Byeong-Beom Kim , Je-Hyeong Park , Jae-Hyoung Youn , Jean-Ho Song , Jong-In Kim
- 申请人： Byeong-Beom Kim , Je-Hyeong Park , Jae-Hyoung Youn , Jean-Ho Song , Jong-In Kim
- 申请人地址： KR
- 专利权人： Samsung Display Co., Ltd.
- 当前专利权人： Samsung Display Co., Ltd.
- 当前专利权人地址： KR
- 代理机构： Innovation Counsel LLP
- 优先权： KR10-2010-0010156 20100203
- 主分类号： H01L21/336
- IPC分类号： H01L21/336 ; H01L21/00 ; H01L21/84 ; H01L29/04 ; H01L29/10 ; H01L27/14 ; H01L31/036 ; H01L23/48 ; C23C14/14 ; C23C14/34 ; H01L23/52 ; H01L29/786
摘要：
A method for forming a thin film according to an exemplary embodiment of the present invention includes forming the thin film at a power density in the range of approximately 1.5 to approximately 3 W/cm2 and at a pressure of an inert gas that is in the range of approximately 0.2 to approximately 0.3 Pa. This process results in an amorphous metal thin film barrier layer that prevents undesired diffusion from adjacent layers, even when this barrier layer is thinner than many conventional barrier layers.