发明授权
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 平版印刷设备和器件制造方法
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申请号： US13226103申请日： 2011-09-06
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公开(公告)号： US08947637B2公开(公告)日： 2015-02-03
- 发明人: Timotheus Franciscus Sengers , Marcus Adrianus Van De Kerkhof , Mark Kroon , Kees Van Weert
- 申请人： Timotheus Franciscus Sengers , Marcus Adrianus Van De Kerkhof , Mark Kroon , Kees Van Weert
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 优先权： EP03255395 20030829
- 主分类号： G03B27/58
- IPC分类号： G03B27/58 ; G03F9/00 ; G03F7/20
摘要：
A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
公开/授权文献
- US20110317143A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 公开/授权日：2011-12-29