发明授权
US08951609B2 CNT devices, low-temperature fabrication of CNT and CNT photo-resists
有权
CNT器件，低温制造CNT和CNT光刻胶
- 专利标题： CNT devices, low-temperature fabrication of CNT and CNT photo-resists
- 专利标题（中）： CNT器件，低温制造CNT和CNT光刻胶
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申请号： US13093597申请日： 2011-04-25
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公开(公告)号： US08951609B2公开(公告)日： 2015-02-10
- 发明人: Shanzhong Wang , Mui Hoon Nai , Zhonglin Miao
- 申请人： Shanzhong Wang , Mui Hoon Nai , Zhonglin Miao
- 申请人地址： SG Singapore
- 专利权人： STMicroelectronics Asia Pacific Pte Ltd
- 当前专利权人： STMicroelectronics Asia Pacific Pte Ltd
- 当前专利权人地址： SG Singapore
- 代理机构： Gardere Wynne Sewell LLP
- 主分类号： B05D3/12
- IPC分类号： B05D3/12 ; B82Y30/00 ; H01L21/208 ; H01L51/00 ; B82Y10/00 ; G03F7/004
摘要：
A nanotube-photoresist composite is fabricated by preparing a nanotube suspension using a nanotube structure-containing raw material, dispersing the nanotube suspension in a photoresist using ultra-sonication to produce a nanotube suspension-photoresist mix, spin-coating the nanotube suspension-photoresist mix on a substrate to form a nanotube suspension-photoresist composite layer, and removing one or more solvents in the nanotube suspension-photoresist composite layer by baking.