Invention Grant
- Patent Title: Silicon carbide powder for producing silicon carbide single crystal and a method for producing the same
- Patent Title (中): 用于生产碳化硅单晶的碳化硅粉末及其制造方法
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Application No.: US13894533Application Date: 2013-05-15
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Publication No.: US08951638B2Publication Date: 2015-02-10
- Inventor: Tomohisa Katou , Yusuke Takeda , Hiroshi Murata
- Applicant: National Institute of Advanced Industrial Science and Technology , Denki Kagaku Kogyo Kabushiki Kaisha
- Applicant Address: JP Tokyo JP Tokyo
- Assignee: Denki Kagaku Kogyo Kabushiki Kaisha,National Institute of Advanced Industrial Science and Technology
- Current Assignee: Denki Kagaku Kogyo Kabushiki Kaisha,National Institute of Advanced Industrial Science and Technology
- Current Assignee Address: JP Tokyo JP Tokyo
- Agency: Lowe Hauptman & Ham, LLP
- Priority: JP2010-254378 20101115
- Main IPC: B32B5/16
- IPC: B32B5/16

Abstract:
A silicon carbide powder for the production of a silicon carbide single crystal has an average particle diameter of 100 μm or more and 700 μm or less and a specific surface area of 0.05 m2/g or more and 0.30 m2/g or less. A method for producing a silicon carbide powder for the production of the silicon carbide single crystal including sintering a silicon carbide powder having an average particle diameter of 20 μm or less under pressure of 70 MPa or less at a temperature of 1900° C. or more and 2400° C. or less and in a non-oxidizing atmosphere, thereby obtaining a sintered body having a density of 1.29 g/cm3 or more; adjusting particle size by means of pulverization of the sintered body; and removing impurities by means of an acid treatment.
Public/Granted literature
- US20130266810A1 SILICON CARBIDE POWDER FOR PRODUCING SILICON CARBIDE SINGLE CRYSTAL AND A METHOD FOR PRODUCING THE SAME Public/Granted day:2013-10-10
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