Invention Grant
- Patent Title: Solar cell texturing
- Patent Title (中): 太阳能电池纹理
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Application No.: US14023423Application Date: 2013-09-10
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Publication No.: US08951825B1Publication Date: 2015-02-10
- Inventor: Scott J. H. Limb , Dirk DeBruyker , Sean Garner
- Applicant: Palo Alto Research Center Incorporated
- Applicant Address: US CA Palo Alto
- Assignee: Palo Alto Research Center Incorporated
- Current Assignee: Palo Alto Research Center Incorporated
- Current Assignee Address: US CA Palo Alto
- Agency: Bever, Hoffman & Harms, LLP
- Agent Patrick T. Bever
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L31/18 ; H01L21/308

Abstract:
Multicrystalline silicon (mc-Si) solar cells having patterned light trapping structures (e.g., pyramid or trough features) are generated by printing a liquid mask material from an array of closely-spaced parallel elongated conduits such that portions of the mc-Si wafer are exposed through openings defined between the printed mask features. Closely spaced mask pattern features are achieved using an array of conduits (e.g., micro-springs or straight polyimide cantilevers), where each conduit includes a slit-type, tube-type or ridge/valley-type liquid guiding channel that extends between a fixed base end and a tip end of the conduit such that mask material supplied from a reservoir is precisely ejected from the tip onto the mc-Si wafer. The exposed planar surface portions are then etched to form the desired patterned light trapping structures (e.g., trough structures).
Information query
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