Invention Grant
- Patent Title: Damascene word line
- Patent Title (中): 大马士革字线
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Application No.: US13347331Application Date: 2012-01-10
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Publication No.: US08951862B2Publication Date: 2015-02-10
- Inventor: Shih-Hung Chen , Hang-Ting Lue , Yen-Hao Shih
- Applicant: Shih-Hung Chen , Hang-Ting Lue , Yen-Hao Shih
- Applicant Address: TW Hsinchu
- Assignee: Macronix International Co., Ltd.
- Current Assignee: Macronix International Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Haynes Beffel & Wolfeld LLP
- Agent Kenta Suzue
- Main IPC: H01L21/336
- IPC: H01L21/336

Abstract:
The technology relates to a damascene word line for a three dimensional array of nonvolatile memory cells. Conductive lines such as silicon are formed over stacked nonvolatile memory structures. Word line trenches separate neighboring ones of the silicon lines. The silicon lines separated by the word line trenches are oxidized, making insulating surfaces in the word line trenches. Word lines are made in the word line trenches.
Public/Granted literature
- US20130175598A1 Damascene Word Line Public/Granted day:2013-07-11
Information query
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