发明授权
- 专利标题: Stacked structure including vertically grown semiconductor, p-n junction device including the stacked structure, and method of manufacturing thereof
- 专利标题(中): 堆叠结构包括垂直生长的半导体,包括堆叠结构的p-n结器件及其制造方法
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申请号: US13244492申请日: 2011-09-25
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公开(公告)号: US08952243B2公开(公告)日: 2015-02-10
- 发明人: Jun-hee Choi
- 申请人: Jun-hee Choi
- 申请人地址: KR Suwon-si
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-si
- 代理机构: Sughrue Mion, PLLC
- 优先权: KR10-2011-0019094 20110303
- 主分类号: H01L31/0352
- IPC分类号: H01L31/0352 ; H01L33/16 ; H01L33/00 ; H01L33/24 ; H01L31/0304 ; H01L31/036 ; H01L31/077 ; H01L31/18 ; H01L33/08
摘要:
A stacked structure may include semiconductors or semiconductor layers grown on an amorphous substrate. A light-emitting device and a solar cell may include the stacked structure including the semiconductors grown on the amorphous substrate. A method of manufacturing the stacked structure, and the light-emitting device and the solar cell including the stacked structure may involve growing a crystalline semiconductor layer on an amorphous substrate.
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