发明授权
- 专利标题： Selecting reference libraries for monitoring of multiple zones on a substrate
- 专利标题（中）： 选择用于监控基板上多个区域的参考库
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申请号： US12847721申请日： 2010-07-30
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公开(公告)号： US08954186B2公开(公告)日： 2015-02-10
- 发明人: Jun Qian , Boguslaw A. Swedek , Harry Q. Lee , Jeffrey Drue David , Sivakumar Dhandapani , Thomas H. Osterheld
- 申请人： Jun Qian , Boguslaw A. Swedek , Harry Q. Lee , Jeffrey Drue David , Sivakumar Dhandapani , Thomas H. Osterheld
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Fish & Richardson P.C.
- 主分类号： G05B23/02
- IPC分类号： G05B23/02
摘要：
A method of configuring a polishing monitoring system includes receiving user input selecting a plurality of libraries, each library of the plurality of libraries comprising a plurality of reference spectra for use in matching to measured spectra during polishing, each reference spectrum of the plurality of reference spectra having an associated index value, for a first zone of a substrate, receiving user input selecting a first subset of the plurality of libraries, and for a second zone of the substrate, receiving user input selecting a second subset of the plurality of libraries.
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