发明授权
- 专利标题: Self-assemblable polymer and methods for use in lithography
- 专利标题(中): 自组装聚合物和用于光刻的方法
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申请号: US14123943申请日: 2012-06-07
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公开(公告)号: US08956804B2公开(公告)日: 2015-02-17
- 发明人: Aurelie Marie Andree Brizard , Sander Frederik Wuister , Roelof Koole , Emiel Peeters
- 申请人: Aurelie Marie Andree Brizard , Sander Frederik Wuister , Roelof Koole , Emiel Peeters
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 国际申请: PCT/EP2012/060784 WO 20120607
- 国际公布: WO2012/175343 WO 20121227
- 主分类号: G03F7/26
- IPC分类号: G03F7/26 ; G03F7/004 ; G03F7/00 ; C30B19/00
摘要:
A block copolymer, adapted to self-assemble to form an ordered pattern on a substrate, has first and second blocks with a terminal moiety covalently bonded to the end of the first block. The molecular weight of the terminal moiety is 20% or less than that of the block copolymer and the terminal moiety has a low chemical affinity for the first block. The terminal moiety can assist the accurate positional placement of the domains of the ordered array and lead to improved critical dimension uniformity and/or reduced line edge roughness. The polymer may be useful in combination with a graphoepitaxy template, where the terminal moiety is chosen to associate with a sidewall of the template. This may reduce undesired aggregation of polymer domains at a sidewall and/or assist in domain placement accuracy.
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