发明授权
- 专利标题: Non-volatile semiconductor storage device
- 专利标题(中): 非易失性半导体存储器件
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申请号: US13671077申请日: 2012-11-07
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公开(公告)号: US08957501B2公开(公告)日: 2015-02-17
- 发明人: Takeshi Hioka , Yoshiaki Fukuzumi
- 申请人: Takeshi Hioka , Yoshiaki Fukuzumi
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Patterson & Sheridan, LLP
- 优先权: JP2011-244097 20111108
- 主分类号: H01L27/06
- IPC分类号: H01L27/06 ; H01L27/115 ; H01L49/02
摘要:
A non-volatile semiconductor storage device contains a memory cell region, a first electrode, and a second electrode. The memory cell region is formed on a substrate and comprises multiple memory cells stacked on the substrate as part of memory strings. Multiple first conductive layers are laminated on the substrate. The first electrode functions as an electrode at one side of a capacitive component and comprises multiple conductive layers stacked on the substrate and separated horizontally from stacked conductive layers of the second electrode which is disposed at a side of the capacitive component opposite the first electrode.
公开/授权文献
- US20130113080A1 NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE 公开/授权日:2013-05-09
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