Invention Grant
- Patent Title: Method and system for use in monitoring properties of patterned structures
- Patent Title (中): 用于监测图案结构特性的方法和系统
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Application No.: US14139913Application Date: 2013-12-24
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Publication No.: US08964178B2Publication Date: 2015-02-24
- Inventor: Yoel Cohen , Boaz Brill
- Applicant: Nova Measuring Instruments Ltd.
- Applicant Address: IL Rehovot
- Assignee: Nova Measuring Instruments Ltd.
- Current Assignee: Nova Measuring Instruments Ltd.
- Current Assignee Address: IL Rehovot
- Agency: AlphaPatent Associates Ltd.
- Agent Daniel J. Swirsky
- Main IPC: G01N21/95
- IPC: G01N21/95 ; G01B11/06 ; G01B11/24 ; G06F15/00

Abstract:
A method and system are presented for use in characterizing properties of an article having a structure comprising a multiplicity of sites comprising different periodic patterns, where method includes providing a theoretical model of prediction indicative of optical properties of different stacks defined by geometrical and material parameters of corresponding sites, said sites being common in at least one of geometrical parameter and material parameter; performing optical measurements on at least two different stacks of the article and generating optical measured data indicative of the geometrical parameters and material composition parameters for each of the measured stacks; processing the optical measured data, said processing comprising simultaneously fitting said optical measured data for the multiple measured stacks with said theoretical model and extracting said at least one common parameter, thereby enabling to characterize the properties of the multi-layer structure within the single article.
Public/Granted literature
- US20140142869A1 METHOD AND SYSTEM FOR USE IN MONITORING PROPERTIES OF PATTERNED STRUCTURES Public/Granted day:2014-05-22
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