Invention Grant
- Patent Title: Optically absorptive material for alignment marks
- Patent Title (中): 对准标记的光学吸收材料
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Application No.: US13455966Application Date: 2012-04-25
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Publication No.: US08967992B2Publication Date: 2015-03-03
- Inventor: Niyaz Khusnatdinov , Kosta S. Selinidis , Joseph Michael Imhof , Dwayne L. LaBrake
- Applicant: Niyaz Khusnatdinov , Kosta S. Selinidis , Joseph Michael Imhof , Dwayne L. LaBrake
- Applicant Address: US TX Austin US TX Austin
- Assignee: Canon Nanotechnologies, Inc.,Molecular Imprints, Inc.
- Current Assignee: Canon Nanotechnologies, Inc.,Molecular Imprints, Inc.
- Current Assignee Address: US TX Austin US TX Austin
- Agent Cameron A. King
- Main IPC: B29C59/00
- IPC: B29C59/00 ; G03F7/00 ; G03F9/00
Abstract:
Imprint lithography templates having alignment marks with highly absorptive material. The alignment marks are insensitive to the effects of liquid spreading and can provide stability and increase contrast to alignment system during liquid imprint filling of template features.
Public/Granted literature
- US20120269972A1 Optically Absorptive Material for Alignment Marks Public/Granted day:2012-10-25
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