发明授权
US08968987B2 Implementing enhanced optical mirror coupling and alignment utilizing two-photon resist
有权
使用双光子抗蚀剂实现增强的光学镜耦合和对准
- 专利标题: Implementing enhanced optical mirror coupling and alignment utilizing two-photon resist
- 专利标题(中): 使用双光子抗蚀剂实现增强的光学镜耦合和对准
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申请号: US13347779申请日: 2012-01-11
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公开(公告)号: US08968987B2公开(公告)日: 2015-03-03
- 发明人: Emmanuel Atta , Darcy Berger , John R. Dangler , Matthew S. Doyle , Jesse Hefner , Thomas W. Liang
- 申请人: Emmanuel Atta , Darcy Berger , John R. Dangler , Matthew S. Doyle , Jesse Hefner , Thomas W. Liang
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理商 Joan Pennington
- 主分类号: G02B6/26
- IPC分类号: G02B6/26 ; B05D5/06 ; G02B6/34
摘要:
A method, system and computer program product for implementing an enhanced optical mirror coupling and alignment mechanism utilizing two-photon resist. An initial placement is provided for one or more vias on a printed circuit board. A via is filled with a resist. A series of tightly focused light beams suitably exposes the resist at varying depths in the via, the varying depths defining a sloped polymer in the via after removing resist that had not been at the focus of the light beam. The sloped polymer is coated with reflective material to reflect light into or out of the via.
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