发明授权
US08968987B2 Implementing enhanced optical mirror coupling and alignment utilizing two-photon resist 有权
使用双光子抗蚀剂实现增强的光学镜耦合和对准

Implementing enhanced optical mirror coupling and alignment utilizing two-photon resist
摘要:
A method, system and computer program product for implementing an enhanced optical mirror coupling and alignment mechanism utilizing two-photon resist. An initial placement is provided for one or more vias on a printed circuit board. A via is filled with a resist. A series of tightly focused light beams suitably exposes the resist at varying depths in the via, the varying depths defining a sloped polymer in the via after removing resist that had not been at the focus of the light beam. The sloped polymer is coated with reflective material to reflect light into or out of the via.
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