Invention Grant
- Patent Title: Method of manufacturing photoelectric conversion device
- Patent Title (中): 制造光电转换装置的方法
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Application No.: US13359606Application Date: 2012-01-27
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Publication No.: US08969713B2Publication Date: 2015-03-03
- Inventor: Min-Seok Oh , Jung-Tae Kim , Nam-Kyu Song , Min Park , Yun-Seok Lee , Czang-Ho Lee , Myung-Hun Shin , Byoung-Kyu Lee , Yuk-Hyun Nam , Seung-Jae Jung , Mi-Hwa Lim , Joon-Young Seo , Dong-Uk Choi , Dong-Seop Kim , Byoung-June Kim
- Applicant: Min-Seok Oh , Jung-Tae Kim , Nam-Kyu Song , Min Park , Yun-Seok Lee , Czang-Ho Lee , Myung-Hun Shin , Byoung-Kyu Lee , Yuk-Hyun Nam , Seung-Jae Jung , Mi-Hwa Lim , Joon-Young Seo , Dong-Uk Choi , Dong-Seop Kim , Byoung-June Kim
- Applicant Address: KR Yongin-Si, Gyeonggi-Do
- Assignee: Samsung SDI Co., Ltd.
- Current Assignee: Samsung SDI Co., Ltd.
- Current Assignee Address: KR Yongin-Si, Gyeonggi-Do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2008-0133646 20081224
- Main IPC: H01L31/0224
- IPC: H01L31/0224 ; H01L31/0376 ; H01L31/068 ; H01L31/078 ; H01L31/0236 ; H01L31/18 ; H01L31/072 ; H01L31/0368

Abstract:
Disclosed herein is a photoelectric conversion device having a semiconductor substrate including a front side and back side, a protective layer formed on the front side of the semiconductor substrate, a first non-single crystalline semiconductor layer formed on the back side of the semiconductor substrate, a first conductive layer including a first impurity formed on a first portion of a back side of the first non-single crystalline semiconductor layer, and a second conductive layer including the first impurity and a second impurity formed on a second portion of the back side of the first non-single crystalline semiconductor layer.
Public/Granted literature
- US20120129295A1 METHOD OF MANUFACTURING PHOTOELECTRIC CONVERSION DEVICE Public/Granted day:2012-05-24
Information query
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