Invention Grant
- Patent Title: Laser produced plasma EUV light source
- Patent Title (中): 激光产生等离子体EUV光源
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Application No.: US14294048Application Date: 2014-06-02
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Publication No.: US08969839B2Publication Date: 2015-03-03
- Inventor: Georgiy O. Vaschenko
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands, B.V.
- Current Assignee: ASML Netherlands, B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: H05H1/42
- IPC: H05H1/42 ; G03F7/20 ; H05G2/00 ; H01J35/20

Abstract:
Methods and apparatus for producing irradiation targets in an extreme ultraviolet (EUV) light source having an irradiation target generating system that includes a nozzle configured for ejecting droplets of a target material, and a subsystem having an electro-actuable element producing a modulation waveform to cause disturbance to the droplets thereby causing at least some of the droplets to coalesce into irradiation targets. There is included a laser producing a beam for irradiating the irradiation targets to generate an EUV-producing plasma, wherein the electro-actuable element is biased against the nozzle to enable transfer of the disturbance to the droplets while permitting relative movement between the electro-actuable element and the nozzle.
Public/Granted literature
- US20140264093A1 LASER PRODUCED PLASMA EUV LIGHT SOURCE Public/Granted day:2014-09-18
Information query
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