Invention Grant
- Patent Title: Combinatorial spin deposition
- Patent Title (中): 组合旋转沉积
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Application No.: US13685961Application Date: 2012-11-27
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Publication No.: US08973524B2Publication Date: 2015-03-10
- Inventor: Richard R. Endo , Rajesh Kelekar
- Applicant: Intermolecular, Inc.
- Applicant Address: US CA San Jose
- Assignee: Intermolecular, Inc.
- Current Assignee: Intermolecular, Inc.
- Current Assignee Address: US CA San Jose
- Main IPC: B05C11/11
- IPC: B05C11/11 ; B05C11/115 ; B05D1/00 ; B05D1/32
Abstract:
A spin deposition apparatus includes a deposition mask configured to be arranged proximate a target substrate. The deposition mask includes at least one fluid reservoir offset from a rotational axis of the deposition mask and configured to hold fluid for dispersal on a portion of a surface of the target substrate.
Public/Granted literature
- US20140147587A1 Combinatorial Spin Deposition Public/Granted day:2014-05-29
Information query
