发明授权
- 专利标题: Method for manufacturing semiconductor device
- 专利标题(中): 制造半导体器件的方法
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申请号: US12064511申请日: 2006-08-22
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公开(公告)号: US08975192B2公开(公告)日: 2015-03-10
- 发明人: Yasunori Kojima , Toshiaki Itabashi
- 申请人: Yasunori Kojima , Toshiaki Itabashi
- 申请人地址: JP Tokyo
- 专利权人: Hitachi Chemical Dupont Microsystems Ltd.
- 当前专利权人: Hitachi Chemical Dupont Microsystems Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Griffin & Szipl, P.C.
- 优先权: JP2005-239610 20050822
- 国际申请: PCT/JP2006/316345 WO 20060822
- 国际公布: WO2007/023773 WO 20070301
- 主分类号: C03C15/00
- IPC分类号: C03C15/00 ; C03C25/68 ; C23F1/00 ; B44C1/22 ; H01L21/302 ; H01L21/461 ; H01L21/56 ; H01L23/31
摘要:
A method is provided for manufacturing a semiconductor device having a heat-resistant resin film with flip-chip connection structure using a solder bump or a gold bump and an epoxy resin compound laminated thereon, in which adhesiveness is improved particularly after exposure to high temperature and high humidity environments for a long period of time, thereby enhancing the reliability of the semiconductor device. The method, in accordance with the present invention, for manufacturing a semiconductor device having a heat-resistant resin film formed on a semiconductor element and an epoxy resin compound layer laminated thereon, comprises the steps of carrying out a plasma treatment on a surface of the heat-resistant resin film on which the epoxy resin compound layer is laminated using a nitrogen atom-containing gas containing at least one of nitrogen, ammonia, and hydrazine.
公开/授权文献
- US20090137129A1 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 公开/授权日:2009-05-28
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