Invention Grant
US08977988B2 Method of optical proximity correction for modifying line patterns and integrated circuits with line patterns modified by the same
有权
用于修改线图案的光学邻近校正方法和由其修改的线图案的集成电路的方法
- Patent Title: Method of optical proximity correction for modifying line patterns and integrated circuits with line patterns modified by the same
- Patent Title (中): 用于修改线图案的光学邻近校正方法和由其修改的线图案的集成电路的方法
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Application No.: US13859718Application Date: 2013-04-09
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Publication No.: US08977988B2Publication Date: 2015-03-10
- Inventor: Kuan-Wen Fang , Chin-Lung Lin , Kuo-Chang Tien , Yi-Hsiu Lee , Chien-Hsiung Wang
- Applicant: United Microelectronics Corp.
- Applicant Address: TW Science-Based Industrial Park, Hsin-Chu
- Assignee: United Microelectronics Corp.
- Current Assignee: United Microelectronics Corp.
- Current Assignee Address: TW Science-Based Industrial Park, Hsin-Chu
- Agent Winston Hsu; Scott Margo
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G06K9/00
Abstract:
A method of optical proximity correction executed by a computer system and integrated circuit layout formed by the same, the step of optical proximity correction comprises: providing an integrated circuit layout with a plurality of parallel line patterns, wherein one side of at least one line pattern is provided with a convex portion; and modifying the integrated circuit layout by forming a concave portion corresponding to the convex portion at the other side of the line pattern.
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