- 专利标题: Photovoltaic cell and method for manufacturing the same
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申请号: US13590747申请日: 2012-08-21
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公开(公告)号: US08980672B2公开(公告)日: 2015-03-17
- 发明人: Mitsunaga Saito , Masahiro Hosoya
- 申请人: Mitsunaga Saito , Masahiro Hosoya
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 主分类号: H01L21/00
- IPC分类号: H01L21/00 ; H01L31/18 ; B82Y10/00 ; H01L51/00 ; H01L31/0224 ; H01L31/0352 ; H01L51/42
摘要:
According to one embodiment, there is provided a method for manufacturing a photovoltaic cell. The method includes forming a structure including a pair of electrodes which are arranged apart from each other, and a hetero-junction type photoelectric conversion layer interposed between the electrodes and containing a p-type semiconductor and a n-type semiconductor, and annealing the photoelectric conversion layer thermally while applying an AC voltage having a frequency of 0.01 kHz or more and less than 1 kHz to control a mixed state of the p-type semiconductor and n-type semiconductor in the photoelectric conversion layer.
公开/授权文献
- US20130213461A1 PHOTOVOLTAIC CELL AND METHOD FOR MANUFACTURING THE SAME 公开/授权日:2013-08-22
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