Invention Grant
- Patent Title: Hydrogen plasma cleaning of germanium oxide surfaces
- Patent Title (中): 氧化锗表面的氢等离子体清洗
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Application No.: US14031975Application Date: 2013-09-19
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Publication No.: US08987143B2Publication Date: 2015-03-24
- Inventor: Ratsamee Limdulpaiboon , Chi-I Lang , Sandip Niyogi , J. Watanabe
- Applicant: Intermolecular, Inc.
- Applicant Address: US CA San Jose
- Assignee: Intermolecular, Inc.
- Current Assignee: Intermolecular, Inc.
- Current Assignee Address: US CA San Jose
- Main IPC: H01L21/302
- IPC: H01L21/302 ; H01L21/02 ; H01L29/66 ; H01L27/146 ; H01L21/283 ; H01L29/41 ; H01L21/3065 ; H01L29/778 ; H01L29/16
Abstract:
Methods and apparatus for processing using a remote plasma source are disclosed. The apparatus includes an outer chamber enclosing a substrate support, a remote plasma source, and a showerhead. A substrate heater can be mounted in the substrate support. A transport system moves the substrate support and is capable of positioning the substrate. The plasma system may be used to generate activated hydrogen species. The activated hydrogen species can be used to etch/clean semiconductor oxide surfaces such as silicon oxide or germanium oxide.
Public/Granted literature
- US20140273493A1 Hydrogen Plasma Cleaning of Germanium Oxide Surfaces Public/Granted day:2014-09-18
Information query
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