Invention Grant
- Patent Title: Memory device having an integrated two-terminal current limiting resistor
- Patent Title (中): 存储器件具有集成的两端限流电阻
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Application No.: US14288003Application Date: 2014-05-27
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Publication No.: US08987865B2Publication Date: 2015-03-24
- Inventor: Dipankar Pramanik , Tony P. Chiang , Mankoo Lee
- Applicant: Intermolecular Inc. , Kabushiki Kaisha Toshiba , SanDisk 3D LLC
- Applicant Address: US CA San Jose JP Tokyo US CA Milpitas
- Assignee: Intermolecular, Inc.,Kabushiki Kaisha Toshiba,SanDisk 3D LLC
- Current Assignee: Intermolecular, Inc.,Kabushiki Kaisha Toshiba,SanDisk 3D LLC
- Current Assignee Address: US CA San Jose JP Tokyo US CA Milpitas
- Main IPC: H01L29/8605
- IPC: H01L29/8605 ; H01L45/00 ; H01L27/24

Abstract:
A resistor structure incorporated into a resistive switching memory cell or device to form memory devices with improved device performance and lifetime is provided. The resistor structure may be a two-terminal structure designed to reduce the maximum current flowing through a memory device. A method is also provided for making such memory device. The method includes depositing a resistor structure and depositing a variable resistance layer of a resistive switching memory cell of the memory device, where the resistor structure is disposed in series with the variable resistance layer to limit the switching current of the memory device. The incorporation of the resistor structure is very useful in obtaining desirable levels of device switching currents that meet the switching specification of various types of memory devices. The memory devices may be formed as part of a high-capacity nonvolatile memory integrated circuit, which can be used in various electronic devices.
Public/Granted literature
- US20140299834A1 Memory Device Having An Integrated Two-Terminal Current Limiting Resistor Public/Granted day:2014-10-09
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