发明授权
- 专利标题： Apparatus to control semiconductor film deposition characteristics
- 专利标题（中）： 控制半导体膜沉积特性的装置
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申请号： US12394203申请日： 2009-02-27
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公开(公告)号： US08991332B2公开(公告)日： 2015-03-31
- 发明人: Satheesh Kuppurao , David K. Carlson , Manish Hemkar , Andrew Lam , Errol Sanchez , Howard Beckford
- 申请人： Satheesh Kuppurao , David K. Carlson , Manish Hemkar , Andrew Lam , Errol Sanchez , Howard Beckford
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Servilla Whitney LLC
- 主分类号： C23C16/46
- IPC分类号： C23C16/46 ; C23C16/52 ; C23C16/44 ; H01L21/67
摘要：
Systems and apparatus are disclosed for adjusting the temperature of at least a portion of the surface of a reaction chamber during a film formation process to control film properties. More than one portion of the chamber surface may be temperature-modulated.