Invention Grant
- Patent Title: System and methods for plasma application
- Patent Title (中): 等离子体应用的系统和方法
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Application No.: US12924404Application Date: 2010-09-27
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Publication No.: US08994270B2Publication Date: 2015-03-31
- Inventor: Il-Gyo Koo , Cameron A. Moore , George J. Collins , Jin-Hoon Cho
- Applicant: Il-Gyo Koo , Cameron A. Moore , George J. Collins , Jin-Hoon Cho
- Applicant Address: US CO Fort Collins
- Assignee: Colorado State University Research Foundation
- Current Assignee: Colorado State University Research Foundation
- Current Assignee Address: US CO Fort Collins
- Main IPC: H05H1/24
- IPC: H05H1/24 ; H01J37/32

Abstract:
The present disclosure provides for a plasma system. The plasma system includes a plasma device, an ionizable media source, and a power source. The plasma device includes an inner electrode and an outer electrode coaxially disposed around the inner electrode. The inner electrode includes a distal portion and an insulative layer that covers at least a portion of the inner electrode. The ionizable media source is coupled to the plasma device and is configured to supply ionizable media thereto. The power source is coupled to the inner and outer electrodes, and is configured to ignite the ionizable media at the plasma device to form a plasma effluent having an electron sheath layer about the exposed distal portion.
Public/Granted literature
- US20110101862A1 System and methods for plasma application Public/Granted day:2011-05-05
Information query
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