Invention Grant
- Patent Title: Substrate structure and color filter
- Patent Title (中): 基板结构和滤色片
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Application No.: US11566816Application Date: 2006-12-05
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Publication No.: US08999496B2Publication Date: 2015-04-07
- Inventor: Ching-Yu Chou
- Applicant: Ching-Yu Chou
- Applicant Address: TW New Taipei
- Assignee: Hon Hai Precision Industry Co., Ltd.
- Current Assignee: Hon Hai Precision Industry Co., Ltd.
- Current Assignee Address: TW New Taipei
- Agency: Novak Druce Connolly Bove + Quigg LLP
- Priority: TW94143564A 20051209; TW94146350A 20051223
- Main IPC: B32B3/00
- IPC: B32B3/00 ; G02B5/20

Abstract:
An exemplary method for manufacturing a substrate structure includes steps of: providing a substrate; forming a plurality of isolated protrusions on the substrate; depositing ink onto the protrusions; and solidifying the ink to form a plurality of ink layers on the respective protrusions. This method can create ink layers with uniform thickness. A substrate structure having ink layers is also included.
Public/Granted literature
- US20070134472A1 SUBSTRATE STRUCTURE AND METHOD FOR MANUFACTURING SAME Public/Granted day:2007-06-14
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