Invention Grant
- Patent Title: Microlens array and scanning exposure device using same
- Patent Title (中): 微透镜阵列和扫描曝光装置使用相同
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Application No.: US14232733Application Date: 2012-07-23
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Publication No.: US09001425B2Publication Date: 2015-04-07
- Inventor: Michinobu Mizumura , Makoto Hatanaka
- Applicant: Michinobu Mizumura , Makoto Hatanaka
- Applicant Address: JP Yokohama-shi, Kanagawa
- Assignee: V Technology Co., Ltd.
- Current Assignee: V Technology Co., Ltd.
- Current Assignee Address: JP Yokohama-shi, Kanagawa
- Agency: McGinn IP Law Group, PLLC.
- Priority: JP2011-167819 20110729
- International Application: PCT/JP2012/068624 WO 20120723
- International Announcement: WO2013/018572 WO 20130207
- Main IPC: G02B27/10
- IPC: G02B27/10 ; G03F7/20 ; G02B27/09 ; G02B7/00 ; G02B3/00

Abstract:
In this microlens array, unitary microlens arrays are respectively stacked onto an upper surface and lower surface of a glass plate, and each of the unitary microlens arrays is supported by an upper plate and a lower plate. Marks for alignment are formed on each of the unitary microlens arrays and on the glass plate, and the unitary microlens arrays and the glass plate are stacked onto each other aligned by these marks. This makes it possible to prevent ununiform exposure in scanning exposure using a plurality of microlens arrays.
Public/Granted literature
- US20140152968A1 MICROLENS ARRAY AND SCANNING EXPOSURE DEVICE USING SAME Public/Granted day:2014-06-05
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