发明授权
- 专利标题： Endpoint detector for a semiconductor processing station and associated methods
- 专利标题（中）： 半导体处理站端点检测器及相关方法
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申请号： US13401295申请日： 2012-02-21
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公开(公告)号： US09002493B2公开(公告)日： 2015-04-07
- 发明人: John H. Zhang , Cindy Goldberg
- 申请人： John H. Zhang , Cindy Goldberg
- 申请人地址： US TX Coppell
- 专利权人： STMicroelectronics, Inc.
- 当前专利权人： STMicroelectronics, Inc.
- 当前专利权人地址： US TX Coppell
- 代理机构： Allen, Dyer, Doppelt, Milbrath & Gilchrist, P.A.
- 主分类号： G06F19/00
- IPC分类号： G06F19/00 ; B24B37/013 ; B24B49/12 ; H01L21/66
摘要：
A semiconductor processing apparatus includes a semiconductor processing station for a semiconductor wafer, and an endpoint detector associated with the semiconductor processing station. The endpoint detector includes a non-contact probe configured to probe the semiconductor wafer, an optical transmitter configured to transmit an optical signal to the non-contact probe, and an optical receiver configured to receive a reflected optical signal from the non-contact probe. The controller controls the semiconductor processing station based on the reflected optical signal.