发明授权
- 专利标题： Forming patterns using thiosulfate polymer compositions
- 专利标题（中）： 使用硫代硫酸盐聚合物组合物形成图案
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申请号： US14158884申请日： 2014-01-20
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公开(公告)号： US09005878B2公开(公告)日： 2015-04-14
- 发明人: Deepak Shukla , Kevin M. Donovan , Mark R. Mis
- 申请人： Deepak Shukla , Kevin M. Donovan , Mark R. Mis
- 申请人地址： US NY Rochester
- 专利权人： Eastman Kodak Company
- 当前专利权人： Eastman Kodak Company
- 当前专利权人地址： US NY Rochester
- 代理商 J. Lanny Tucker
- 主分类号： G03F7/26
- IPC分类号： G03F7/26 ; G03F7/30
摘要：
A thiosulfate polymer composition includes an electron-accepting photosensitizer component, either as a separate compound or as an attachment to the thiosulfate polymer. The thiosulfate polymer composition can be applied to various articles and used to form a predetermined polymeric pattern after photothermal reaction to form crosslinked disulfide bonds, removing non-crosslinked polymer, and reaction with a disulfide-reactive material.
公开/授权文献
- US20140287365A1 FORMING PATTERNS USING THIOSULFATE POLYMER COMPOSITIONS 公开/授权日：2014-09-25
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