Invention Grant
US09006352B2 Photosensitive alkali-soluble resin, method of preparing the same, and color photosensitive resist containing the same
有权
感光性碱溶性树脂及其制备方法和含有该光敏抗蚀剂的光敏抗蚀剂
- Patent Title: Photosensitive alkali-soluble resin, method of preparing the same, and color photosensitive resist containing the same
- Patent Title (中): 感光性碱溶性树脂及其制备方法和含有该光敏抗蚀剂的光敏抗蚀剂
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Application No.: US13968106Application Date: 2013-08-15
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Publication No.: US09006352B2Publication Date: 2015-04-14
- Inventor: Lin Li , Shi Shu , Wenwen Sun , Ming Zhao
- Applicant: BOE Technology Group Co., Ltd.
- Applicant Address: CN Beijing
- Assignee: BOE Technology Group Co., Ltd.
- Current Assignee: BOE Technology Group Co., Ltd.
- Current Assignee Address: CN Beijing
- Priority: CN201210292588 20120816
- Main IPC: C08F222/08
- IPC: C08F222/08 ; C08F8/00 ; C08F8/06 ; C08F212/08 ; C08F220/28 ; G03F7/004 ; G03F7/027 ; G03F7/00 ; C08G81/02 ; C08F222/06 ; C08G65/32 ; G03F7/033

Abstract:
Provided is a photosensitive alkali-soluble resin comprising a compound of formula (I), a method of preparing the same, and a color photosensitive resist containing the same, wherein n1, n2, R1, R2 and R3 are defined as herein. The photosensitive alkali-soluble resin is prepared by: copolymerizing ethylene oxide with α-hydroxyalkyl phenyl ketone to obtain the first intermediate product, followed by copolymerizing the first intermediate product with a copolymerization product of glycerin acrylate, styrene, and maleic anhydride to obtain the second intermediate product, and oxidizing the second intermediate product to produce the photosensitive alkali-soluble resin.
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