Invention Grant
US09007563B2 Illumination system having a beam deflection array for illuminating a mask in a microlithographic projection exposure apparatus
有权
具有用于在微光刻投影曝光装置中照射掩模的光束偏转阵列的照明系统
- Patent Title: Illumination system having a beam deflection array for illuminating a mask in a microlithographic projection exposure apparatus
- Patent Title (中): 具有用于在微光刻投影曝光装置中照射掩模的光束偏转阵列的照明系统
-
Application No.: US12711059Application Date: 2010-02-23
-
Publication No.: US09007563B2Publication Date: 2015-04-14
- Inventor: Markus Deguenther , Michael Layh
- Applicant: Markus Deguenther , Michael Layh
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03F7/20
Abstract:
An illumination system for illuminating a mask in a scanning microlithographic projection exposure apparatus has an objective with an object plane, at least one pupil surface and an image plane in which a mask can be arranged. A beam deflection array of reflective or transparent beam deflection elements is provided, where each beam deflection element is adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements are arranged in or in close proximity to the object plane of the objective.
Public/Granted literature
- US20100157269A1 ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS Public/Granted day:2010-06-24
Information query
