Invention Grant
- Patent Title: Target material refinement device and target supply apparatus
- Patent Title (中): 目标材料细化装置和目标供应装置
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Application No.: US13770939Application Date: 2013-02-19
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Publication No.: US09039957B2Publication Date: 2015-05-26
- Inventor: Yutaka Shiraishi , Osamu Wakabayashi
- Applicant: Gigaphoton Inc.
- Applicant Address: JP Tochigi
- Assignee: GIGAPHOTON INC.
- Current Assignee: GIGAPHOTON INC.
- Current Assignee Address: JP Tochigi
- Agency: McDermott Will & Emery LLP
- Priority: JP2012-037771 20120223; JP2012-250018 20121114
- Main IPC: C22B9/00
- IPC: C22B9/00 ; H05G2/00
Abstract:
A target material refinement device may include a refinement tank to accommodate a target material, a heating section to heat the interior of the refinement tank, and an oxygen-atom removing section to remove oxygen atoms present in the target material.
Public/Granted literature
- US20130221587A1 TARGET MATERIAL REFINEMENT DEVICE AND TARGET SUPPLY APPARATUS Public/Granted day:2013-08-29
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