发明授权
US09040842B2 Mechanical adhesion of copper metallization to dielectric with partially cured epoxy fillers
有权
通过部分固化的环氧树脂填料,铜金属化对电介质的机械附着力
- 专利标题: Mechanical adhesion of copper metallization to dielectric with partially cured epoxy fillers
- 专利标题(中): 通过部分固化的环氧树脂填料,铜金属化对电介质的机械附着力
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申请号: US13867851申请日: 2013-04-22
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公开(公告)号: US09040842B2公开(公告)日: 2015-05-26
- 发明人: Ravi Nalla , Omar Bchir , Houssam Jomaa
- 申请人: Intel Corporation
- 申请人地址: US CA Santa Clara
- 专利权人: Intel Corporation
- 当前专利权人: Intel Corporation
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Schwegman Lundberg & Woessner, P.A.
- 主分类号: H01L23/00
- IPC分类号: H01L23/00 ; H05K3/38 ; H05K3/46 ; H05K1/02 ; H05K3/18
摘要:
In some embodiments, an improved mechanical adhesion of copper metallization to dielectric with partially cured epoxy fillers is presented. In this regard, a substrate build-up film is introduced having epoxy material and a plurality of epoxy microspheres, wherein an interior of the microspheres is not fully cured. Other embodiments are also disclosed and claimed.
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