发明授权
- 专利标题: Transistors and methods of manufacturing the same
- 专利标题(中): 晶体管及其制造方法
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申请号: US13792525申请日: 2013-03-11
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公开(公告)号: US09040958B2公开(公告)日: 2015-05-26
- 发明人: Chang-seung Lee , Yong-sung Kim , Joo-ho Lee , Yong-seok Jung
- 申请人: Samsung Electronics Co., Ltd.
- 申请人地址: KR Gyeonggi-Do
- 专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人: SAMSUNG ELECTRONICS CO., LTD.
- 当前专利权人地址: KR Gyeonggi-Do
- 代理机构: Harness, Dickey & Pierce, P.L.C.
- 优先权: KR10-2012-0080251 20120723
- 主分类号: H01L29/06
- IPC分类号: H01L29/06 ; H01L29/16 ; H01L29/66 ; H01L29/78 ; H01L29/49 ; H01L29/786
摘要:
Transistors, and methods of manufacturing the transistors, include graphene and a material converted from graphene. The transistor may include a channel layer including graphene and a gate insulating layer including a material converted from graphene. The material converted from the graphene may be fluorinated graphene. The channel layer may include a patterned graphene region. The patterned graphene region may be defined by a region converted from graphene. A gate of the transistor may include graphene.
公开/授权文献
- US20140021446A1 TRANSISTORS AND METHODS OF MANUFACTURING THE SAME 公开/授权日:2014-01-23
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