发明授权
- 专利标题: High voltage GaN transistor
- 专利标题(中): 高压GaN晶体管
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申请号: US13445632申请日: 2012-04-12
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公开(公告)号: US09041064B2公开(公告)日: 2015-05-26
- 发明人: Yifeng Wu , Primit Parikh , Umesh Mishra
- 申请人: Yifeng Wu , Primit Parikh , Umesh Mishra
- 申请人地址: US CA Goleta
- 专利权人: Cree, Inc.
- 当前专利权人: Cree, Inc.
- 当前专利权人地址: US CA Goleta
- 代理机构: Koppel, Patrick, Heybl & Philpott
- 主分类号: H01L29/66
- IPC分类号: H01L29/66 ; H01L29/778 ; H01L29/40 ; H01L29/20
摘要:
A multiple field plate transistor includes an active region, with a source, drain, and gate. A first spacer layer is between the source and the gate and a second spacer layer between the drain and the gate. A first field plate on the first spacer layer and a second field plate on the second spacer layer are connected to the gate. A third field plate connected to the source is on a third spacer layer, which is on the gate and the first and second field plates and spacer layers. The transistor exhibits a blocking voltage of at least 600 Volts while supporting current of at least 2 or 3 Amps with on resistance of no more than 5.0 or 5.3 mΩ-cm2, respectively, and at least 900 Volts while supporting current of at least 2 or 3 Amps with on resistance of no more than 6.6 or 7.0 mΩ-cm2, respectively.
公开/授权文献
- US20120223366A1 HIGH VOLTAGE GAN TRANSISTOR 公开/授权日:2012-09-06
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