Invention Grant
US09046775B2 Composition for forming liquid immersion upper layer film, resist pattern-forming method, polymer, and compound
有权
用于形成液浸上层膜的组合物,抗蚀剂图案形成方法,聚合物和化合物
- Patent Title: Composition for forming liquid immersion upper layer film, resist pattern-forming method, polymer, and compound
- Patent Title (中): 用于形成液浸上层膜的组合物,抗蚀剂图案形成方法,聚合物和化合物
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Application No.: US14032528Application Date: 2013-09-20
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Publication No.: US09046775B2Publication Date: 2015-06-02
- Inventor: Shinya Minegishi , Kiyoshi Tanaka , Kazunori Kusabiraki
- Applicant: JSR CORPORATION
- Applicant Address: JP Tokyo
- Assignee: JSR CORPORATION
- Current Assignee: JSR CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2012-218885 20120928
- Main IPC: G03F7/11
- IPC: G03F7/11 ; G03F7/20 ; C08F214/18

Abstract:
A composition for forming a liquid immersion upper layer film includes a polymer component including a polymer having a structural unit represented by a formula (1); and a solvent. R1 represents a carboxy group or a group represented by a formula (2); X represents a single bond, a divalent hydrocarbon group having 1 to 20 carbon atoms or a divalent fluorinated hydrocarbon group having 1 to 20 carbon atoms; R2 represents a hydrocarbon group having 1 to 20 carbon atoms and a valency of (n+1), a fluorinated hydrocarbon group having 1 to 20 carbon atoms and a valency of (n+1), or one of these groups each including between adjacent two carbon atoms thereof —CO—, —COO—, —O—, —NR′—, —CS—, —S—, —SO—, —SO2— or a combination thereof; and R3 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms.
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