Invention Grant
- Patent Title: Nonvolatile memory devices and methods forming the same
- Patent Title (中): 非易失性存储器件及其形成方法
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Application No.: US14135049Application Date: 2013-12-19
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Publication No.: US09047952B2Publication Date: 2015-06-02
- Inventor: Changhyun Lee , Byoungkeun Son
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do
- Agency: Muir Patent Consulting, PLLC
- Priority: KR10-2010-0096991 20101005
- Main IPC: H01L27/088
- IPC: H01L27/088 ; G11C16/04 ; H01L21/28 ; H01L27/115

Abstract:
Provided are nonvolatile memory devices and methods of forming the same. The nonvolatile memory device includes a plurality of word lines, a ground select line, string select line, and a dummy word line. Each of distances between the dummy word line and the ground select line and between the dummy word line and the word line is greater than a distance between a pair of the word lines adjacent to each other.
Public/Granted literature
- US20140104945A1 NONVOLATILE MEMORY DEVICES AND METHODS FORMING THE SAME Public/Granted day:2014-04-17
Information query
IPC分类: