Invention Grant
- Patent Title: Substrate recycling method
- Patent Title (中): 基材回收方法
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Application No.: US14264924Application Date: 2014-04-29
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Publication No.: US09048086B2Publication Date: 2015-06-02
- Inventor: Su Youn Hong , Joo Won Choi , Jeong Hun Heo , Su Jin Shin , Choong Min Lee
- Applicant: Seoul Viosys Co., Ltd.
- Applicant Address: KR Ansan-si
- Assignee: Seoul Viosys Co., Ltd.
- Current Assignee: Seoul Viosys Co., Ltd.
- Current Assignee Address: KR Ansan-si
- Agency: H.C. Park & Associates, PLC
- Priority: KR10-2013-0047382 20130429
- Main IPC: H01L21/20
- IPC: H01L21/20 ; H01L21/02

Abstract:
Exemplary embodiments of the present disclosure relate to a substrate recycling method and a recycled substrate. The method includes separating a first surface of a substrate from an epitaxial layer; forming a protective layer on an opposing second surface of the substrate; electrochemically etching the first surface of the substrate; and chemically etching the electrochemically etched first surface of the substrate.
Public/Granted literature
- US20140322899A1 SUBSTRATE RECYCLING METHOD Public/Granted day:2014-10-30
Information query
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