发明授权
- 专利标题： Integrated device and manufacturing method
- 专利标题（中）： 集成器件及制造方法
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申请号： US12949488申请日： 2010-11-18
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公开(公告)号： US09049806B2公开(公告)日： 2015-06-02
- 发明人: Masafumi Ide , Toru Takizawa , Kaoru Yoda
- 申请人： Masafumi Ide , Toru Takizawa , Kaoru Yoda
- 申请人地址： JP Tokyo
- 专利权人： CITIZEN HOLDINGS CO., LTD.
- 当前专利权人： CITIZEN HOLDINGS CO., LTD.
- 当前专利权人地址： JP Tokyo
- 代理机构： Sughrue Mion, PLLC
- 优先权： JP2009-265055 20091120
- 主分类号： G02F2/02
- IPC分类号： G02F2/02 ; G02B6/12 ; H05K3/32 ; G02B6/42 ; H05K1/11 ; G02F1/35 ; H01S5/022 ; H05K1/02 ; H05K1/03
摘要：
An integrated device includes an optical element and an electrical element that are implemented on a substrate. The optical element and the electrical element are bonded by surface-activated bonding technology to a bonding portion that is formed on the substrate and made of metal material.
公开/授权文献
- US20110122481A1 INTEGRATED DEVICE AND MANUFACTURING METHOD 公开/授权日：2011-05-26
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