Invention Grant
- Patent Title: Semiconductor processing apparatus comprising a solid solution ceramic formed from yttrium oxide, zirconium oxide, and aluminum oxide
- Patent Title (中): 包括由氧化钇，氧化锆和氧化铝形成的固溶陶瓷的半导体处理装置
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Application No.: US13986040Application Date: 2013-03-25
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Publication No.: US09051219B2Publication Date: 2015-06-09
- Inventor: Jennifer Y. Sun , Ren-Guan Duan , Jie Yuan , Li Xu , Kenneth S. Collins
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agent Shirley L. Church Esq.
- Main IPC: C04B35/505
- IPC: C04B35/505 ; C04B35/486 ; B32B18/00 ; H01J37/32
Abstract:
A solid solution-comprising ceramic article useful in semiconductor processing, which is resistant to erosion by halogen-containing plasmas. The solid solution-comprising ceramic article is formed from a combination of yttrium oxide, zirconium oxide, and aluminum oxide. In a first embodiment, the solid solution-comprising ceramic article is a solid, sintered body of the solid solution ceramic material. In a second embodiment, the solid solution-comprising article comprises a substrate underlying a solid solution-comprising coating.
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