Functional film, liquid immersion member, method of manufacturing liquid immersion member, exposure apparatus, and device manufacturing method

Invention Grant

US09057955B2 Functional film, liquid immersion member, method of manufacturing liquid immersion member, exposure apparatus, and device manufacturing method 有权

Title translation: 功能膜，浸液部件，浸液部件的制造方法，曝光装置以及装置的制造方法

Patent Title: Functional film, liquid immersion member, method of manufacturing liquid immersion member, exposure apparatus, and device manufacturing method
Patent Title (中): 功能膜，浸液部件，浸液部件的制造方法，曝光装置以及装置的制造方法
Application No.: US14159871

Application Date: 2014-01-21
Publication No.: US09057955B2

Publication Date: 2015-06-16
Inventor: Tsukasa Kishiume , Yusuke Taki
Applicant: NIKON CORPORATION
Applicant Address: JP Tokyo
Assignee: NIKON CORPORATION
Current Assignee: NIKON CORPORATION
Current Assignee Address: JP Tokyo
Agency: Oliff PLC
Main IPC: G03F7/20
IPC: G03F7/20 ; G03F7/11

Abstract:

A functional film which is applied to a surface of a base material includes a film of Ti-doped tetrahedral amorphous carbon (ta-C:Ti film).

Abstract(Chinese):

施加到基材表面的功能膜包括Ti掺杂的四面体无定形碳（ta-C：Ti膜）的膜。

Public/Granted literature

Information query

Espacenet

IPC分类:

G	物理
G03	摄影术；电影术；利用了光波以外其他波的类似技术；电记录术；全息摄影术
G03F	图纹面的照相制版工艺，例如，印刷工艺、半导体器件的加工工艺；其所用材料；其所用原版；其所用专用设备（照相排版装置入B41B；为摄影用的感光材料或处理入G03C；电记录、感光层或处理入G03G）
G03F7/00	图纹面，例如，印刷表面的照相制版如光刻工艺；图纹面照相制版用的材料，如：含光致抗蚀剂的材料；图纹面照相制版的专用设备（用于特殊工艺的光致抗蚀剂结构见相关的位置，例如，B44C，H01L，例如，H01L21/00，H05K）
G03F7/20	.曝光及其设备（复制用照相印制设备入G03B27/00）