Invention Grant
- Patent Title: Through silicon via bidirectional repair circuit of semiconductor apparatus
- Patent Title (中): 通过半导体器件的双向修复电路
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Application No.: US13900546Application Date: 2013-05-23
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Publication No.: US09059586B2Publication Date: 2015-06-16
- Inventor: Pei-Ling Tseng , Keng-Li Su
- Applicant: Industrial Technology Research Institute
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Agency: Jianq Chyun IP Office
- Priority: TW101150804A 20121228
- Main IPC: H02H3/00
- IPC: H02H3/00 ; H02H3/20

Abstract:
A TSV bidirectional repair circuit of a semiconductor apparatus is provided. The bidirectional repair circuit includes a first and a second bidirectional switches and at least two transmission path modules. The first and the second bidirectional switches determine whether to transmit an input signal of a first chip or a second chip to each of the transmission path modules according to a switch signal. Each transmission path module includes at least two data path circuits and corresponding TSVs. Each data path circuit includes an input driving circuit, a short-circuit detection circuit and a leakage current cancellation circuit. The short-circuit detection circuit detects whether short-circuit on the corresponding TSV and a silicon substrate is present according to the input signal and the corresponding TSV to produce a short-circuit detection output signal.
Public/Granted literature
- US20140185174A1 THROUGH SILICON VIA BIDIRECTIONAL REPAIR CIRCUIT OF SEMICONDUCTOR APPARATUS Public/Granted day:2014-07-03
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