发明授权
- 专利标题： Mask and optical filter manufacturing apparatus including the same
- 专利标题（中）： 掩模和滤光器制造装置包括其
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申请号： US13393522申请日： 2011-07-26
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公开(公告)号： US09069257B2公开(公告)日： 2015-06-30
- 发明人: Sin Young Kim , Kyung Ki Hong , Hyuk Yoon , Won Cheul Ju , Yong Il Cho , Moon Soo Park , Dong Ho Ko , Su Young Ryu
- 申请人： Sin Young Kim , Kyung Ki Hong , Hyuk Yoon , Won Cheul Ju , Yong Il Cho , Moon Soo Park , Dong Ho Ko , Su Young Ryu
- 申请人地址： KR Seoul
- 专利权人： LG CHEM, LTD.
- 当前专利权人： LG CHEM, LTD.
- 当前专利权人地址： KR Seoul
- 代理机构： McKenna Long & Aldridge LLP
- 优先权： KR10-2010-0072018 20100726; KR10-2010-0090604 20100915
- 国际申请： PCT/KR2011/005514 WO 20110726
- 国际公布： WO2012/015229 WO 20120202
- 主分类号： G02F1/1337
- IPC分类号： G02F1/1337 ; G03B27/02 ; G03B27/10 ; G03B27/72 ; G03F1/42 ; G02B5/20 ; G02F1/13 ; G03F7/00 ; G03F7/24
摘要：
A mask and an optical filter manufacturing apparatus having the same are provided. The optical filter manufacturing apparatus includes a roll used in a roll-to-roll process, a base film wound around the roll, a light source that generates light for exposure, a polarizing plate that is installed at an emission side of the light source and polarizes light generated from the light source, and a mask that causes a pattern to be formed on the base film and includes a plurality of guide slits that are opened to have a predetermined thickness and a predetermined width. According to the present invention, the entire surface of the base film can be irradiated with a uniform light quantity. Thus, a pattern can be uniformly formed on the base film, the quality of a product can be improved, and the characteristics of the base film can be accurately realized.