A plating structure for wafer level packages are disclosed and may include a semiconductor wafer comprising a plurality of semiconductor die and a plating structure for forming an under bump metal on redistribution layers on the plurality of semiconductor die. The plating structure may comprise a plating connection line around a periphery of the semiconductor wafer, and a plating bar coupling the plating connection line to plating traces on the plurality of semiconductor die. The plating traces may be electrically coupled to the redistribution layers on the plurality of semiconductor die. The semiconductor wafer may comprise a reconstituted wafer of said semiconductor die. The semiconductor wafer may comprise a wafer prior to singulating the plurality of semiconductor die. The plating bar may be located in a sawing line for the singulating of the plurality of semiconductor die. A passivation layer may cover the redistribution layer and the plating traces.