Invention Grant
- Patent Title: Method for cleansing nanoimprinting molds
- Patent Title (中): 清洁纳米压印模具的方法
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Application No.: US13932126Application Date: 2013-07-01
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Publication No.: US09073102B2Publication Date: 2015-07-07
- Inventor: Masafumi Yoshida
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2011-001349 20110106
- Main IPC: B08B3/12
- IPC: B08B3/12 ; B29C33/62 ; B82Y10/00 ; B82Y40/00 ; G03F7/00 ; C11D11/00 ; G03F7/30
Abstract:
A method for cleansing a mold of the present invention suppresses generation of damage is a method for cleansing a nanoimprinting mold, in which a mesa type mold is immersed in cleansing fluid and ultrasonic cleansing is performed in a state in which a mold release layer containing a fluorine compound is provided on a patterned region of the mesa type mold.
Public/Granted literature
- US20130291890A1 METHOD FOR CLEANSING NANOIMPRINTING MOLDS Public/Granted day:2013-11-07
Information query
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